Skip to content Skip to main menu
PRODUCT

Semiconductor

eNPL-Ar90s Hydrophilic
1.png
1.png
  • 1.png
  • 1713236694873.png
Items Description
Process Gas Ar/O2/N2
Process Speed 10~80mm/s (30mm/s)
AP Plasma Unit ·Plasma Module Electrode Headset : 810mm x 90mm x 60mm Scan Width: 800mm Metal Body : Anodized Al ·Power Supply: 1,000W
Dimension (W x L x H) 2,500 x 1,400 x 1,600 mm
Jig Size 800 x 700 mm

Description

  • Novel designed head, matcher, RF power generator
  • Cleaning and surface treatment technology
  • Stable plasma ignition & Surface treatment at a long distance

Technology

Plasma

Plasma