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PRODUCT

Semiconductor

eNPL-HPS52s Hydrophobicity
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  • 스크린샷 2024-04-27 131901.png
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Items Description
Process Gas Ar/O2/N2
Process Speed 10 ~ 80mm/s (30mm/s)
AP Plasma Unit Plasma Module Electrode Headset : 810mm x 90mm x 60mm Scan Width: 800mm Metal Body : Anodized Al Power Supply: 1,000W
Dimension (W x L x H) Approx. 2,500 x 1,400 x 1,600 mm
Jig Size 800 x 700 mm

Description

  • Head, matcher, RF power generator
  • Cleaning and surface treatment technology
  • Stable plasma ignition & Surface treatment at a long distance

Technology

Plasma

Plasma